Crosstalk Reduction - References

1. Rhodes, H., et al., CMOS imager technology shrinks and image performance. Microelectronics and Electron Devices, 2004 IEEE Workshop on, 2004: p. 7-18.

2. Palik, E.D., Handbook of optical constants of solids . 1985: Academic Press Orlando.

3. Hsu, T.H., et al., A high-efficiency CMOS image sensor with air gap in situ MicroLens (AGML) fabricated by 0.18-µm CMOS technology. Electron Device Letters, IEEE, 2005. 26 (9): p. 634-636.

4. Yaung, D.N., et al., Air-gap guard ring for pixel sensitivity and crosstalk improvement in deep sub-micron CMOS image sensor. IEDM Tech. Dig, 2003: p. 1-16.5.

5. Hsu, T.H., et al., Dramatic reduction of optical crosstalk in deep-submicrometer CMOS imager with air gap guard ring. Electron Device Letters, IEEE, 2004. 25 (6): p. 375-377.

6. Hsu, T.H., et al., Color mixing improvement of CMOS image sensor with air-gap-guard ring in deep-submicrometer CMOS technology. Electron Device Letters, IEEE, 2005. 26 (5): p. 301-303.

7. Hsu, T.H., et al., Light guide for pixel crosstalk improvement in deep submicron CMOS image sensor. Electron Device Letters, IEEE, 2004. 25 (1): p. 22-24.